System for treating wastewater from electronics and semiconductor fabrication facilities

A method for treating wastewater comprising:

• sending wastewater from at least one inflow pipe and valve assembly coupled to at least one reactor tank assembly into the at least one reactor tank assembly through at least one inlet header port assembly disposed on a top portion of the at least one reactor tank assembly;
• mixing the wastewater by way of waterflow pressure generated by at least one circulation pump assembly;
• further mixing the wastewater by way of at least one mixer assembly,
• mixing to substantially uniform intermixing of an at least one or more of acid and caustic introduced to the wastewater within the at least one reactor tank assembly;
• sending wastewater from the at least one reactor tank assembly through at least one outflow pipe and valve assembly coupled by at least one outlet port assembly of the at least one reactor tank assembly;
• measuring pH by at least one pH sensor disposed within wastewater that has flowed into the outflow pipe;
• if the pH is in an unacceptable range, treating the wastewater by introducing at least one or more of an acid and a caustic into the wastewater flow by way of at least one secondary stream of the wastewater, a carrier-injector pump assembly pumping the secondary stream of wastewater from wastewater flowing through the at least one outflow pipe and valve assembly;
• if the pH was in an unacceptable range, sending at least a portion of the treated wastewater, back into at least one reactor tank assembly by way of at least one return flow pipe and valve assembly of the at least one outflow pipe and valve assembly;
• and
• if the pH is in an acceptable range, discharging at least a portion of the wastewater from the system for treating wastewater.

A system for treating wastewater comprising:

• at least one reactor tank assembly;
• a distribution trough of the at least one reactor tank assembly adapted to receive wastewater and distribute that wastewater substantially evenly over the surface of wastewater already in the at least one reactor tank assembly;
• the at least one reactor tank assembly adapted to be operable in lead-lag flows and parallel flows with at least one second reactor tank assembly, changes between lead-lag flow and parallel flow adapted to be enacted at least one or more of manually and automatically;
• at least one inflow pipe and valve assembly coupled to the at least one reactor tank assembly adapted to direct wastewater into the at least one reactor tank assembly through at least one inlet header port assembly disposed on a top portion of the at least one reactor tank assembly;
• at least one outflow pipe and valve assembly coupled by at least one outlet port assembly of the at least one reactor tank assemblies adapted to direct wastewater out from the at least one reactor tank assemblies;
• at least one return flow pipe and valve assembly of the at least one outflow pipe and valve assembly adapted to direct, as required, at least a portion of the wastewater flowing out from the at least one reactor tank assemblies back into at least one reactor tank assembly;
• at least one circulation pump assembly disposed on the at least one outflow pipe and valve assembly;
• at least one carrier-injector pump assembly, the at least one carrier-injector pump assembly adapted to pump a portion of wastewater fed to it as a secondary stream of wastewater flowing through the at least one outflow pipe and valve assembly;
• at least one mixer assembly operationally disposed within each reactor tank assembly adapted to mix wastewater in the at least one reactor tank assemblies, inclusive, when present, of wastewater drawn from at least one reactor tank assembly and reintroduced into the at least one reactor tank assemblies through the at least one return flow pipe and valve assembly;
• at least one pH sensor assembly disposed at least partially within the wastewater flow and operationally coupled to at least one computer system, the at least one computer system adapted to control introducing at least one or more of acid from an at least one acid storage reactor tank and valve assembly operationally coupled to the wastewater flow and a caustic from an at least one caustic storage reactor tank and valve assembly operationally coupled to the wastewater flow, the at least one or more acid and caustic used to change the pH of the wastewater, the at least one or more acid and caustic introduced to the wastewater as the wastewater flows through one or more streams of the outflow pipe and valve assembly;
• and
• one or more from a group of:
• temperature sensors disposed within the at least one or more of the reactor tank assemblies and pipe and valve assemblies, pressure sensors disposed within at least one or more of the reactor tank assemblies, and flow sensors disposed within at least one or more of the pipe and valve assemblies.