Vertical dual-chamber annealing device

A vertical dual-chamber annealing device, comprising:

• an outer chamber unit, wherein an internal pressure that the outer chamber unit can bear is 10 bar to 1000 bar, and the outer chamber unit comprises:
• an outer chamber body;
• an outer chamber formed in the outer chamber body and configured to accommodate an inert gas;
• a first gas injection port disposed on the outer chamber body and configured for injecting of the inert gas into the outer chamber;
• a first gas discharge port disposed on the outer chamber body and configured for discharging of the inert gas out the outer chamber;
• a second gas injection port disposed on the outer chamber body;
• a second gas discharge port disposed on the outer chamber body;
• a cooling jacket disposed on the outer chamber body;
• a lower cover assembly disposed on a bottom of the outer chamber body and configured to open and close the outer chamber body;
• and
• a plurality of through holes radially penetrating the outer chamber body;
• an inner chamber body located in the outer chamber, and the inner chamber body comprising:
• an inner chamber formed in the inner chamber body and configured to accommodate a reactive gas, wherein the reactive gas is injected from the second gas injection port and discharged from the second gas discharge port;
• a closed end located on one end of the inner chamber body;
• an open end located on another end of the inner chamber body and facing the lower cover assembly;
• and
• a flange disposed on an outer side surface of the inner chamber body;
• a temperature control unit located between the outer chamber body and the inner chamber body and configured to increase or decrease a temperature in the inner chamber;
• a supporting structure located between the outer chamber body and the inner chamber body, and configured to support the flange, be connected to the outer chamber body, and fix the inner chamber body in the outer chamber body, wherein the supporting structure comprises:
• a flange fastener located between the outer chamber body and the inner chamber body, and configured to support the flange and limit a movement of the inner chamber body;
• a plurality of moving shafts respectively disposed in the through holes of the outer chamber body, configured to support the flange fastener, and be connected to the outer chamber body;
• and
• a plurality of shaft sealing rings disposed in the outer chamber body and respectively surrounding the moving shafts, and configured to respectively seal the through holes;
• and
• a gas-tight seal structure located between the outer chamber body and the inner chamber body, and configured to isolate the inert gas and the reactive gas.