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AssigneeSoleras Advanced Coatings BV
InventorsIgnacio CARETTI GIANGASPRO, David DEBRUYNE, Freddy FACK, Wilmert DE BOSSCHER
Estimating the term…
A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.
-14. (canceled)
A target having a single piece target material for sputter deposition, wherein the target comprises at least 1 mm or more of thickness of material for sputtering having a lamellar structure, the material for sputtering further comprising a metal oxide with at least 50 wt. %, of tungsten oxide where the atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide,
Dependencies are inferred from the claim text.