Method for analyzing disturbing influences in a multi-beam particle microscope, associated computer program product and multi-beam particle microscope
OwnerDavid Disterheftinventor
Life of this patent
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Abstract
A method for analyzing disturbing influences in a multi-beam particle microscope which operates using a plurality of individual charged particle beams arranged in a raster arrangement includes the following steps: providing an object; stationary scanning the object at a first position via the plurality of the individual particle beams during a predetermined irradiation time T, as a result of which latent structures are formed on the object; raster scanning the object comprising the first position with the formed latent structures via the plurality of the individual particle beams; and analyzing the latent structures.
Claims29
A method of using a multi-beam particle microscope which generates a plurality of individual charged particle beams arranged in a raster arrangement, the method comprising:
- stationary scanning an object at a first position via the plurality of the individual particle beams during a predetermined irradiation time T, thereby forming latent structures on the object;
- raster-scanning the first position of the object comprising the latent structures via the plurality of the individual particle beams;
- and
- analyzing the latent structures.
A method of producing marker structures on an object via a multi-beam particle beam system operating with a plurality of individual charged particle beams, the method comprising:
- irradiating the object in a stationary manner with the plurality of individual particle beams during a predetermined irradiation time, thereby forming latent structures in the form of the marker structures on the object.
Dependencies are inferred from the claim text.