# US 2024/0201604 A1 · Euv lithography system comprising a gas-binding component in the form of a foil

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- Number: US 2024/0201604 A1
- Document ID: US20240201604A1
- Status: Published application
- Kind: A1
- Application number: 18/590,076
- Filed: 2024-02-28
- Published: 2024-06-20
- Earliest claimed: 2021-09-14
- Assignees: Carl Zeiss SMT GmbH
- Applicants: Carl Zeiss SMT GmbH
- Inventors: Ralf WICHARD
- Web page: https://patentgrep.com/patent/US20240201604A1

## CPC

- G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps}
- G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources}
- G03F 7/70233: {Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems}
- G03F 7/70825: {Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707)}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

An EUV lithography system (1) including: a housing (26), at least one reflective optical element (M1, M2) disposed within an interior (27) of the housing (26), and at least one gas-binding component (31a-c) having a gas-binding material for binding gaseous contaminating substances (29) present in the interior (27). The gas-binding component is formed as a foil (31a-c) and a coating (33, 33a,b) containing the gas-binding material is applied on at least one side (32a, 32b) of the foil (31a-c).

## Claims

### Claim 1

An extreme ultraviolet (EUV) lithography system, comprising:
a housing having an interior,
at least one reflective optical element disposed within the interior of the housing, and
at least one gas-binding component having a gas-binding material for binding of gaseous contaminating substances present in the interior,
wherein the gas-binding component is configured as a foil, wherein a coating containing the gas-binding material is applied on at least one side of the foil, and wherein the foil has a thickness between 1 μm and 1 mm.

### Claim 2 (depends on 1)

The EUV lithography system as claimed in claim 1, wherein the foil contains the gas-binding material.

### Claim 3 (depends on 1)

The EUV lithography system as claimed in claim 1, wherein the coating has a thickness between 1 nm and 10 μm.

### Claim 4 (depends on 1)

The EUV lithography system as claimed in claim 1, wherein the gas-binding material is selected from the group consisting of: Ta, Nb, Ti, Zr, Th, Ni, Ru, Rh.

### Claim 5 (depends on 1)

The EUV lithography system as claimed in claim 1, wherein the foil is a polymer foil or a metal foil.

### Claim 6 (depends on 5)

The EUV lithography system as claimed in claim 5, wherein the polymer foil is a polyimide foil.

### Claim 7 (depends on 1)

The EUV lithography system as claimed in claim 1, wherein the foil is connected to a surface of the housing and/or to at least one surface of at least one component disposed in the interior of the housing.

### Claim 8 (depends on 7)

The EUV lithography system as claimed in claim 7, wherein the foil is detachably connected to the surface of the housing and/or to the at least one surface of the at least one component disposed in the interior of the housing.

### Claim 9 (depends on 7)

The EUV lithography system as claimed in claim 7, wherein an adhesive layer for connecting the foil to the surface of the housing and/or to the at least one surface of the at least one component disposed in the interior of the housing is applied to one side of the foil.

### Claim 10 (depends on 9)

The EUV lithography system as claimed in claim 9, wherein the adhesive layer detachably connects the foil to the surface of the housing and/or to the at least one surface of the at least one component disposed in the interior of the housing.

### Claim 11 (depends on 7)

The EUV lithography system as claimed in claim 7, wherein the foil is connected by electrostatic attraction to the surface of the housing and/or to the at least one surface of the at least one component disposed in the interior of the housing.

### Claim 12 (depends on 7)

The EUV lithography system as claimed in claim 7, wherein the component disposed in the interior of the housing forms a casing encapsulating a beam path of the EUV lithography system.