Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (I) that generates an acid upon irradiation with actinic rays or radiation,

• wherein the compound (I) has at least two acid anionic groups and cationic groups equal in number to the acid anionic groups,
• wherein at least one of the acid anionic groups and at least one of the cationic groups are linked via covalent bonding, and
• wherein the at least two acid anionic groups in the compound (I) include at least two types of anionic groups selected from the group consisting of the following formulas (C-1) to (C-15):
• wherein, in the general formulas (C-1) to (C-15),
• * represents a bonding position;
• Rf1 to Rf8 each independently represent a fluorine atom or a monovalent substituent including at least one fluorine atom;
• Rf9 represents a perfluoroalkyl group;
• R1 to R7 each independently represent a hydrogen atom or a monovalent substituent including no fluorine atom;
• and
• Ar1 to Ar4 each independently represent an aromatic ring.