# US 2024/0201580 A1 · Photomask handling assembly for atmospheric pressure plasma chamber

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- Number: US 2024/0201580 A1
- Document ID: US20240201580A1
- Status: Published application
- Kind: A1
- Application number: 18/082,948
- Filed: 2022-12-16
- Published: 2024-06-20
- Earliest claimed: 2022-12-16
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: Nolan Layne ZIMMERMAN; Banqiu WU
- Web page: https://patentgrep.com/patent/US20240201580A1

## CPC

- G03F 1/82: Auxiliary processes, e.g. cleaning or inspecting
- G03F 1/66: Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
- G03F 9/7046: {Strategy, e.g. mark, sensor or wavelength selection}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

An automatic photomask handling assembly is employed for holding a photomask for cleaning processes in an atmospheric pressure plasma (APP) chamber. The automatic photomask handling assembly includes a set of stationary standoffs with each of the stationary standoffs having a first end solidly mounted to the photomask handling assembly and a second end that contacts an underside of a photomask. The automatic photomask handling assembly also has a handling stage that holds the photomask for processing. The handling stage has a set of through openings that allow the set of stationary standoffs to pass through the handling stage as the handling stage moves vertically. The handling stage also has a set of plates that automatically clamp and unclamp a photomask as the handling stage moves vertically. The set of plates completely surrounds the photomask such that the clamped photomask and the set of plates form a continuous surface.

## Claims

### Claim at position 1

-20. (canceled)

### Claim 21

An chamber for cleaning a photomask, comprising:
a plasma reactor; and
a photomask handling assembly positioned below the plasma reactor, the photomask handling assembly including a handling stage with an opening area configured to receive the photomask and a set of plates surrounding the opening area, wherein the set of plates are configured to move towards the opening area to clamp the photomask.

### Claim 22 (depends on 21)

The chamber of claim 21, further comprising:
a set of stationary standoffs with each stationary standoff having a first end solidly mounted to the photomask handling assembly and a second end configured to contact an underside of the photomask through an opening in the handling stage.

### Claim 23 (depends on 21)

The chamber of claim 21, wherein the plasma reactor includes a plurality of reactor heads in the chamber.

### Claim 24 (depends on 21)

The chamber of claim 21, further comprising:
a rotation assembly having a rotating portion internal to the handling stage, the rotating portion coupled to the set of plates, wherein the rotating portion is configured to adjust a clamping force applied to the set of plates when a rotation orientation of the rotating portion is altered.

### Claim 25 (depends on 24)

The chamber of claim 24, wherein the rotation assembly is coupled to the set of plates via links.

### Claim 26 (depends on 21)

The chamber of claim 21, wherein the handling stage has an internal assembly that is pneumatic or motor driven.

### Claim 27 (depends on 21)

The chamber of claim 21, further comprising:
a rotation control post with a straight vertical side and a first end solidly mounted to the photomask handling assembly and a second end with an angled profile; and
a rotation assembly with a lower portion extending through a bottom surface of the handling stage and configured to contact the straight vertical side of the rotation control post to maintain a rotation orientation and to contact the angled profile of the second end of the rotation control post to change the rotation orientation of an upper portion internal to the handling stage, wherein the upper portion is configured to adjust a clamping force applied to the set of plates when the rotation orientation is altered.

### Claim 28 (depends on 21)

The chamber of claim 21, further comprising:
at least one sensor positioned in the chamber and configured to detect when the set of plates or the photomask would interfere with a plurality of reactor heads of the plasma reactor.

### Claim 29 (depends on 21)

The chamber of claim 21, wherein at least one of:
the handling stage is configured to apply a clamping force of approximately 0.25 pounds to approximately 10 pounds on each side of the photomask;
the handling stage has springs that are configured to apply a force to the set of plates to clamp the photomask; or
the handling stage is configured to limit motion with stops for at least two plates of the set of plates.

### Claim 30 (depends on 21)

The chamber of claim 21, further comprising:
a controller configured to move the handling stage in a vertical direction to clamp and unclamp the photomask.

### Claim 31 (depends on 21)

The chamber of claim 21, further comprising:
a controller configured to move the handling stage in a horizontal direction based upon a cleaning process that controls a speed, back and forth motion, and position of the handling stage.

### Claim 32

A photomask handling assembly to support a photomask, comprising:
a handling stage having an opening area configured to receive the photomask, and a set of plates surrounding the opening area, wherein the set of plates are configured to move towards the opening area to clamp the photomask.

### Claim 33 (depends on 32)

The photomask handling assembly of claim 32, wherein the set of plates are configured to automatically move towards the opening area to clamp the photomask when the handling stage moves vertically.

### Claim 34 (depends on 32)

The photomask handling assembly of claim 32, further comprising:
a set of stationary standoffs with each stationary standoff having a first end solidly mounted and a second end configured to contact an underside of the photomask, wherein the handling stage has a set of through openings that are configured to allow the set of stationary standoffs to pass through the handling stage as the handling stage moves vertically.

### Claim 35 (depends on 34)

The photomask handling assembly of claim 34, further comprising at least one of:
a) a rotation control post with a straight vertical side and a first end solidly mounted and a second end with an angled profile; and
a rotation assembly with a lower portion extending through a bottom surface of the handling stage and configured to contact the straight vertical side of the rotation control post to maintain a rotation orientation and to contact the angled profile of the second end of the rotation control post to change the rotation orientation of an upper portion internal to the handling stage, wherein the upper portion is configured to adjust a clamping force applied to the set of plates when the rotation orientation is altered; or
b) a motion guard assembly with a first portion solidly mounted and a second portion mounted to the handling stage which is configured to stop horizontal motion of the handling stage until a bottom surface of the handling stage is above a set of stationary standoffs.

### Claim 36 (depends on 32)

The photomask handling assembly of claim 32, further comprising:
a rotation assembly having a rotating portion internal to the handling stage, the rotating portion coupled to the set of plates, wherein the rotating portion is configured to adjust a clamping force applied to the set of plates when a rotation orientation of the rotating portion is altered.

### Claim 37 (depends on 36)

The photomask handling assembly of claim 36, wherein the rotation assembly is coupled to the set of plates via links.

### Claim 38 (depends on 32)

The photomask handling assembly of claim 32, wherein the handling stage includes an internal assembly that is pneumatic or motor driven.

### Claim 39 (depends on 32)

The photomask handling assembly of claim 32, wherein the handling stage is configured to apply a clamping force of approximately 0.25 pounds to approximately 10 pounds on each side of the photomask.

### Claim 40 (depends on 32)

The photomask handling assembly of claim 32, wherein at least one of:
the handling stage has springs that are configured to apply a force to the set of plates to clamp the photomask; or
the handling stage is configured to limit motion with stops for at least two plates of the set of plates.
