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US 2024/0201575 A1Published application
Photosensitive surface treatment agent, laminate, transistor, method for forming pattern and method for manufacturing transistor
AssigneeNikon Corporation
InventorsYusuke KAWAKAMI, Kazuo YAMAGUCHI, Michiko ITOU
Life of this patent
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Abstract
A photosensitive surface treatment agent containing a compound represented by the following formula (1) or a polymer compound derived from the following formula (1).
Claims20
A photosensitive surface treatment agent comprising:
- a compound represented by the following formula (1) or a polymer compound derived from the following formula (1),
- [in the formula (1), R1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R2 and R3 are each independently an alkyl group having 1 to 3 carbon atoms or a fluoroalkyl group having 1 to 13 carbon atoms, R4 is a hydrogen atom or a nitro group, n1 is 0 or 1, and Y is one of a polymerizable group-containing group and a linear or branched alkyl group having 1 to 20 carbon atoms].
A transistor comprising:
- a compound represented by the following formula (1) or a polymer compound derived from the following formula (1),
- [in the formula (1), R1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R2 and R3 are each independently an alkyl group having 1 to 3 carbon atoms or a fluoroalkyl group having 1 to 13 carbon atoms, R4 is a hydrogen atom or a nitro group, n1 is 0 or 1, and Y is one of a polymerizable group-containing group and a linear or branched alkyl group having 1 to 20 carbon atoms].
Dependencies are inferred from the claim text.