Display device and manufacturing method of the same
AssigneeSamsung Display Co., Ltd.
InventorsDo Gi LIM, Sung Mo KANG, Dong Seong KOO, Su Jung KIM, Ji Young BANG, Ji Hea LIM
Life of this patent
Estimating the term…
Abstract
A display device and a manufacturing method of the same are provided. The display device comprises a substrate, a lower metal layer disposed on the substrate, and a gate metal layer disposed on the lower metal layer, wherein the gate metal layer includes a first portion covering the lower metal layer in a plan view, and a second portion protruding in a first direction from the lower metal layer in a plan view, and the lower metal layer includes a concavo-convex pattern disposed at a portion overlapping the second portion of the gate metal layer.
Claims20
A display device comprising:
- a substrate;
- a lower metal layer disposed on the substrate;
- and
- a gate metal layer disposed on the lower metal layer,
- wherein the gate metal layer includes:
- a first portion covering the lower metal layer in a plan view;
- and
- a second portion protruding in a first direction from the lower metal layer in a plan view, and
- wherein the lower metal layer includes a concavo-convex pattern disposed at a portion overlapping the second portion of the gate metal layer.
A manufacturing method of display device, the manufacturing method comprising:
- forming a material layer for a lower metal layer on a substrate;
- forming a photoresist layer on the material layer for the lower metal layer;
- disposing a mask having a light transmitting area and a light blocking area formed therein on the photoresist layer;
- exposing the photoresist layer using light passing through the light transmitting region of the mask, at least a portion of the light passing through the light transmission area being diffracted to expose a portion of the photoresist layer disposed on a lower side of the light blocking area;
- forming a photoresist pattern by developing the exposed portion of the photoresist layer;
- and
- forming a lower metal layer by etching the material layer for the lower metal layer using the photoresist pattern as an etch mask.
Dependencies are inferred from the claim text.