Metal based hydrogen barrier

A processing tool comprising:

• a central transfer station comprising at least one robot configured to move a wafer;
• a plurality of process stations, each process station connected to the central transfer station and providing a processing region separated from processing regions of adjacent process stations, the plurality of process stations comprising a metal liner deposition chamber, a metal cap deposition chamber, and an annealing chamber;
• and
• a controller connected to the central transfer station and the plurality of process stations, the controller configured to activate the robot to move the wafer between process stations, including:
• depositing a metal liner on the wafer in the metal liner deposition chamber,
• depositing a metal cap directly on the metal liner in the metal cap deposition chamber, and
• exposing the wafer to an anneal process in the annealing chamber.