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US 2024/0194499 A1Published application
Apparatus for cleaning process and method for cleaning process
AssigneeSamsung Electronics Co., Ltd.
InventorChaelyoung KIM
Life of this patent
Estimating the term…
Abstract
In a method for cleaning process, a substrate on which a layer is formed may be loaded on a substrate stage. A photocurable resin may be spin coated on the layer to form a photocurable resin layer. Light may be irradiated onto the photocurable resin layer for curing the photocurable resin layer to form a polymer layer containing particles adsorbed from a surface of the layer. The polymer layer containing the particles may be removed.
Claims14
-7. (canceled)
An apparatus for a cleaning process, comprising:
- a chamber;
- a substrate stage at a lower portion of an inside of the chamber, and the substrate stage configured to horizontally rotate;
- a nozzle structure over the substrate stage in the chamber;
- and
- a light source structure configured to face the substrate stage in the chamber,
- wherein the light source structure includes a lamp unit configured to irradiate light and a protective structure configured to protect the lamp unit and be coupled to the lamp unit.
3 more elements
An apparatus for a cleaning process, comprising:
- a chamber;
- a substrate stage at a lower portion of inside of the chamber, and the substrate stage configured to horizontally rotate;
- a nozzle structure over the substrate stage in the chamber, and the nozzle structure including a nozzle and a driver configured to drive and move the nozzle;
- and
- a lamp over the nozzle structure in the chamber,
- wherein a light emission surface of the lamp is configured to completely overlap a portion of the nozzle structure depending on a position of the nozzle structure.
3 more elements
Dependencies are inferred from the claim text.