Substrate processing apparatus

A substrate processing apparatus, comprising:

• a plurality of processing parts arrayed in an up-and-down direction, each of which is capable of supplying a plurality of kinds of processing fluids to a substrate;
• a plurality of exhaust pipes extending upward from said plurality of processing parts, into which exhaust gases from said plurality of processing parts flow, respectively, each of said plurality of exhaust pipes having an upper end portion and a lower end portion;
• two or more collecting pipes arranged above said plurality of processing parts, said two or more collecting pipes corresponding to two or more fluid classifications, respectively, into which said plurality of kinds of processing fluids are classified;
• a plurality of flow path switching parts which are provided at the upper end portions of said plurality of exhaust pipes, respectively, each of said plurality of flow path switching parts connecting said upper end portion to said two or more collecting pipes and switching a flow path of exhaust gas flowing in said exhaust pipe, among said two or more collecting pipes;
• a plurality of outside air introduction parts each of which is connected to said two or more collecting pipes, said plurality of outside air introduction parts corresponding to said plurality of flow path switching parts, respectively;
• and
• a control part for controlling said plurality of flow path switching parts in accordance with the processing fluids used in said plurality of processing parts, wherein
• said two or more collecting pipes overlap said plurality of processing parts in said up-and-down direction while being stacked in said up-and-down direction, and
• said plurality of flow path switching parts are connected to one lateral side of said two or more collecting pipes, and said plurality of outside air introduction parts are connected to the other lateral side of said two or more collecting pipes.