Substrate processing method, substrate processing apparatus, and dry processing liquid

A substrate processing apparatus for processing a substrate, comprising;

• a chemical solution supplier that supplies a chemical solution to a surface of a substrate;
• a rinse liquid supplier that supplies a rinse liquid to said surface of said substrate;
• a dry processing liquid supplier that supplies a heated dry processing liquid to said surface of said substrate;
• and
• a dry processing unit that dries said substrate by removing said dry processing liquid from said surface of said substrate,
• wherein said dry processing liquid has a lower surface tension than said rinse liquid,
• a boiling point of said dry processing liquid is higher than a boiling point of said rinse liquid, and
• said dry processing liquid that comes in contact with said surface of said substrate has a temperature that is a predetermined contact temperature higher than or equal to the boiling point of said rinse liquid and lower than the boiling point of said dry processing liquid.

A dry processing liquid for use in substrate processing,

• a substrate processing method using said dry processing liquid comprising:
• a) supplying a chemical solution to a surface of a substrate;
• b) supplying a rinse liquid to said surface of said substrate after said operation a);
• c) bringing said dry processing liquid that is heated, into contact with said surface of said substrate after said operation b);
• and
• d) drying said substrate by removing said dry processing liquid from said surface of said substrate after said operation c),
• wherein said dry processing liquid contains fluorine-containing alcohol,
• said dry processing liquid has a lower surface tension than said rinse liquid,
• a boiling point of said dry processing liquid is higher than a boiling point of said rinse liquid, and
• said dry processing liquid that comes in contact with said surface of said substrate in said operation c) has a temperature that is a predetermined contact temperature higher than or equal to the boiling point of said rinse liquid and lower than the boiling point of said dry processing liquid.