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US 2024/0194464 A1Published application
Stable ground anode for thin film processing
OwnerSamuel D. Harkness, IV, Thomas P. Nolan +1inventors
InventorsSamuel D. Harkness, IV, Thomas P. Nolan, Stephen M. Daly
Life of this patent
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Abstract
An anode for a plasma chamber, having an anode block having a front surface to face a plasma and a rear surface to face away from the plasma; a magnet positioned within the anode block and generating magnetic field lines extending outwardly from the front surface of the anode block; and an electron filter bar spaced apart and extending over the front surface of the anode block and intercepting at least part of the magnetic field lines.
Claims21
An anode for a plasma chamber, comprising:
- an anode block having a front surface to face a plasma and a rear surface to face away from the plasma;
- a magnet positioned within the anode block and generating magnetic field lines extending outwardly from the front surface of the anode block;
- an electron filter bar spaced apart and extending over the front surface of the anode block and intercepting at least part of the magnetic field lines.
Dependencies are inferred from the claim text.