Plasma processing apparatus, information processing apparatus, plasma processing method, and correction method

An information processing apparatus comprising:

• a reception circuitry configured to receive an input of a generation period and a rotation speed of a stage as a processing condition for a plasma processing in which the generation period during which a plasma is generated inside a processing container and a non-generation period during which no plasma is generated are alternately repeated a plurality of times while rotating the stage, the stage being located inside the processing container and configured to place a substrate thereon;
• and
• a correction circuitry configured to correct at least one of the generation period and the rotation speed received from the reception circuitry such that the stage rotates N times (N is an integer of 1 or more) during generation of the plasma inside the processing container.

A correction method comprising:

• (a) receiving, by a reception circuitry, an input of a generation period and a rotation speed of a stage as a processing condition for a plasma processing in which the generation period during which a plasma is generated inside a processing container and a non-generation period during which no plasma is generated are alternately repeated a plurality of times while rotating the stage, the stage being located inside the processing container and configured to place a substrate thereon;
• and
• (b) correcting at least one of the generation period and the rotation speed received from the reception circuitry such that the stage rotates N times (N is an integer of 1 or more) during generation of the plasma inside the processing container.