Photo-definable hydrophobic compositions
AssigneeHewlett-Packard Development Company, L.P.
InventorsBo Song, Chien-Hua Chen, Michael G. Groh
Life of this patent
Estimating the term…
Abstract
A photo-definable hydrophobic composition (“composition”) is presented. The composition can include from about 0.01 wt % to about 20 wt % of a polyether modified siloxane and from about 80 wt % to about 99.99 wt % of a polymeric photoresist. The polymeric photoresist can be selected from an epoxy-based photoresist, a bisbenzocyclobutene-based photoresist, a polyimide-based photoresist, a polybenzoxazole-based photoresist, a polyimide-polybenzoxazole-based photoresist, an admixture, or a combination thereof.
Claims15
A photo-definable hydrophobic composition comprising:
- from about 0.01 wt % to about 20 wt % of a polyether modified siloxane;
- and
- from about 80 wt % to about 99.99 wt % of a polymeric photoresist.
A microfluidic device comprising:
- a hydrophilic substrate of a hydrophilic material having a water contact angle from about 50° to about 90°;
- a first fluid interface region including the hydrophilic material exposed at the first fluid interface region;
- and
- a second fluid interface region including a photo-definable hydrophobic composition applied on the hydrophilic material at the second fluid interface region, wherein the photo-definable hydrophobic composition comprises a polyether modified siloxane admixed with a polymeric photoresist, and wherein photo-definable hydrophobic composition having a water contact angle from about 91° to about 150°,
- wherein a differential between the water contact angle of the hydrophilic material at the first fluid interface region and the water contact angle of the photo-definable hydrophobic composition at the second fluid interface region is from about 20° to about 80°.
A method of applying photo-definable hydrophobic composition to a microfluidic device comprising:
- admixing a polyether modified siloxane and a polymeric photoresist to form a photo-definable hydrophobic composition;
- applying the photo-definable hydrophobic composition to a hydrophilic surface of a hydrophilic material;
- applying a photoresist mask over a selected area of the photo-definable hydrophobic composition;
- exposing the microfluidic device to ultraviolet radiation, wherein an area of the photo-definable hydrophobic composition becomes crosslinked with exposure to the ultraviolet radiation;
- and
- removing the photoresist mask and uncrosslinked photo-definable hydrophobic composition from the hydrophilic surface.
Dependencies are inferred from the claim text.