Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition satisfying a requirement X or a requirement Y below:

• Requirement X:
• the composition includes a resin X1 that undergoes a decrease in molecular weight caused by scission of a main chain due to action of exposure, acid, base, or heating and satisfies at least one of requirements A1 to A3 below,
• Requirement A1:
• the resin X1 has a group that decreases polarity due to action of exposure, acid, base, or heating,
• Requirement A2:
• the resin X1 has an interactive group that forms an interaction with an onium salt compound and that is released from the interaction due to action of exposure, acid, base, or heating, and the composition further includes an onium salt compound,
• Requirement A3:
• the resin X1 has a polar group, and the composition further includes a compound that reacts with the polar group due to action of exposure, acid, base, or heating,
• Requirement Y:
• the composition includes a resin Y1 that undergoes a decrease in molecular weight caused by scission of a main chain due to action of exposure, acid, base, or heating and another resin Y2 other than the resin Y1 and satisfies at least one of requirements B1 to B3 below,
• Requirement B1:
• the resin Y2 has a group that decreases polarity due to action of exposure, acid, base, or heating,
• Requirement B2:
• the resin Y2 has an interactive group that forms an interaction with an onium salt compound and that is released from the interaction due to action of exposure, acid, base, or heating, and the composition further includes an onium salt compound,
• Requirement B3:
• the resin Y2 has a polar group, and the composition further includes a compound that reacts with the polar group due to action of exposure, acid, base, or heating.