Pellicle, original plate for light exposure, light exposure device, method for producing pellicle, and method for producing semiconductor device

A pellicle comprising:

• a support frame having an opening;
• and
• a pellicle film that covers the opening and that is supported by the support frame, wherein:
• the pellicle film has a self-supporting film region covering the opening,
• the self-supporting film region contains an exposing region and a peripheral border region surrounding the exposing region,
• the peripheral border region has a thick film portion having a thicker film thickness than a film thickness of the exposing region, and
• the following (i) or (ii) is satisfied:
• (i) the support frame is a rectangular frame formed by a pair of longer side portions and a pair of shorter side portions,
• the thick film portion is located in at least a pair of longer side regions formed along the longer side portions, in the peripheral border region, in an extending direction in which the longer side portions extend, and
• the pair of longer side regions is a region between two locations apart by a distance representing at least 5% of a length, in the opening, of each of the longer side portions, toward each of one direction and another direction from a center portion of each of the longer side portions in the extending direction, in the peripheral border region;
• (ii) the support frame is a square frame formed from a pair of first side portions and a pair of second side portions,
• the thick film portion is, in the peripheral border region, located in at least:
• a pair of first center regions formed along the first side portions in a first extending direction in which the first side portions extend, and
• a pair of second center regions formed along the second side portions in a second extending direction in which the second side portions extend;
• the pair of first center regions is a region between two locations apart by a distance representing at least 5% of a length, in the opening, of each of the first side portions, toward each of one direction and another direction from a center portion of each of the first side portions in the first extending direction, in the peripheral border region, and
• the pair of second center regions is a region between two locations apart by a distance representing at least 5% of a length, in the opening, of each of the second side portions, toward each of one direction and another direction from a center portion of each of the second side portions in the second extending direction, in the peripheral border region.