Substrate inspecting apparatus and operating method thereof
AssigneeSemes Co., Ltd.
InventorYong Jun LEE
Life of this patent
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Abstract
Proposed is a substrate inspecting apparatus and an operating method of the substrate inspecting apparatus capable of detecting and correcting angle of incidence (AOI) distortion occurring during an optical-based substrate inspection process. The substrate inspecting apparatus includes a light source generating incident light, an illumination optical system forming an optical path of the incident light, an imaging optical system forming an optical path of reflected light reflected from a substrate, a light detector that receives the reflected light and converts the received reflected light into an electrical signal, and a processor that generates a spectral image from the electrical signal.
Claims20
An optical-based substrate inspecting apparatus, comprising:
- a light source configured to generate incident light;
- an illumination optical system configured to form an optical path of the incident light;
- an imaging optical system configured to form an optical path of reflected light reflected from a substrate;
- a light detector configured to receive the reflected light and convert the received reflected light into an electrical signal;
- and
- a processor configured to generate a spectral image from the electrical signal;
- wherein the processor is configured to:
- obtain standard reflectance distribution data according to changes in inspection parameters for a first substrate which is a reference substrate;
- identify configuration values for the inspection parameters;
- obtain measured reflectance distribution data for a second substrate which is another reference substrate, using the inspection parameters to which the configuration values are applied;
- calculate an angle of incidence (AOI) distribution within a field of view (FOV) by comparing the standard reflectance distribution data and the measured reflectance distribution data;
- and
- detect a distortion area where AOI distortion occurs in the FOV based on the AOI distribution.
An operating method of an optical-based substrate inspecting apparatus, the operating method comprising:
- obtaining standard reflectance distribution data according to changes in inspection parameters for a first substrate;
- identifying configuration values for the inspection parameters;
- obtaining measured reflectance distribution data for a second substrate using the inspection parameters to which the configuration values are applied;
- calculating an angle of incidence (AOI) distribution within a field of view (FOV) by comparing the standard reflectance distribution data and the measured reflectance distribution data;
- and
- detecting a distortion area where AOI distortion occurs in the FOV based on the AOI distribution.
An operating method of an optical-based substrate inspecting apparatus, the operating method comprising:
- obtaining standard reflectance distribution data according to changes in inspection parameters for a first substrate;
- identifying configuration values for the inspection parameters;
- obtaining measured reflectance distribution data for a second substrate using the inspection parameters to which the configuration values are applied;
- calculating an angle of incidence (AOI) distribution within a field of view (FOV) by comparing the standard reflectance distribution data and the measured reflectance distribution data;
- detecting a distortion area where AOI distortion occurs in the FOV based on the AOI distribution;
- outputting an alarm about an occurrence of the AOI distortion;
- obtaining reference reflectance distribution data for a third substrate using the inspection parameters to which the configuration values applied;
- comparing the reference reflectance distribution data and the measured reflectance distribution data to extract a reference AOI value from the distortion area;
- correcting the AOI distortion in the distortion area using the reference AOI value;
- outputting a spectral image with the AOI distortion corrected;
- and
- investigating surface characteristics of the second substrate from the spectral image.
Dependencies are inferred from the claim text.