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US 2024/0192111 A1Published application
Substrate liquid-treatment device
AssigneeTokyo Electron Limited
InventorsHiroshi MARUMOTO, Suguen LEE, Masashi ENOMOTO
Life of this patent
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Abstract
A substrate liquid-processing apparatus includes: a processing tank storing a processing liquid for liquid-processing of a substrate within an inside; an imager configured to acquire an image of the processing liquid of the inside of the processing tank; and an image processor comprising a bubble data acquisitor configured to perform image processing on the image and to acquire bubble data representing the state of bubbles in the processing liquid.
Claims20
A substrate liquid-processing apparatus comprising:
- a processing tank storing a processing liquid for liquid-processing of a substrate within an inside;
- an imager configured to acquire an image of the processing liquid of the inside of the processing tank;
- and
- an image processor comprising a bubble data acquisitor configured to perform image processing on the image and to acquire bubble data representing a state of bubbles in the processing liquid.
1 more element
Dependencies are inferred from the claim text.