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US 2024/0191004 A1Published application
Three-dimensional nanolithography systems and methods
AssigneePurdue Research Foundation
InventorsLiang Pan, Xianfan Xu, Bryan William Boudouris
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Abstract
A three-dimensional nanolithography system includes forming a photocurable resin including one or more organic monomers, a photoinitiator, and an inhibitor, defining a lithographical patterning region, directing a light beam toward the lithographical patterning region to initiate polymerization, and controlling an initiator depletion technique to reduce an undesired portion of the polymerization.
Claims20
A method of forming nanoscale objects, comprising:
- (a) forming a photocurable resin including one or more organic monomers, a photoinitiator, and an inhibitor;
- (b) defining a lithographical patterning region;
- (c) directing a light beam toward the lithographical patterning region to initiate polymerization;
- and
- (d) controlling an initiator depletion technique to reduce an undesired portion of the polymerization.
2 more elements
A method of generating three-dimensional nanoscale objects in a lithographical patterning area, comprising:
- (a) forming a photocurable resin including one or more organic monomers, a photoinitiator, and an inhibitor;
- (b) directing a light beam toward the lithographical patterning area to initiate polymerization;
- and
- (c) controlling an initiator depletion technique to reduce an undesired portion of the polymerization, wherein controlling the initiator depletion technique includes gradually reducing the photoinitiator.
1 more element
Dependencies are inferred from the claim text.