Display panel and method for fabricating display panel

A method for fabricating a display panel, comprising following steps:

• providing a substrate and fabricating a thin film transistor device layer on the substrate, wherein the thin film transistor device layer includes an active layer, a gate disposed on the active layer, a gate disposed on the gate, and an interlayer dielectric layer disposed on the electrode;
• etching and forming a via hole in the thin film transistor device layer, and fabricating a first conductive layer on the thin film transistor device layer, so that the first conductive layer is electrically connected to the active layer through the via hole;
• fabricating a source/drain metal layer on the first conductive layer, fabricating a photoresist on the source/drain metal layer, performing a first etching on the first conductive layer and the source/drain metal layer through the photoresist to form a plurality of openings, wherein the thickness of the photoresist is different at different areas;
• fabricating another photoresist on the source/drain metal layer, performing a second etching on the source/drain metal layer by using a half-mask process, and fabricating the source and drain electrodes of the thin film transistor;
• fabricating a passivation layer on the source/drain metal layer and the first conductive layer, fabricating a planarization layer on the passivation layer, and etching to form a third via hole;
• fabricating an electrode layer on the planarization layer, wherein the electrode layer is electrically connected to the first conductive layer through the third via hole;
• and
• inkjet-printing a light-emitting layer on the electrode layer with, and drying and curing the light-emitting layer.