Thermal choke plate

A substrate processing system comprising:

• a chamber body defining a transfer region;
• a substrate support disposed within the transfer region;
• a lid plate seated on the chamber body, wherein the lid plate defines an aperture through the lid plate;
• and
• a choke plate seated on the lid plate along a first surface of the choke plate, wherein:
• the choke plate defines a first aperture through the plate and a second aperture through the plate;
• the second aperture is laterally offset from the first aperture;
• the choke plate comprises a flange that defines a purging inlet;
• and
• the choke plate comprises a rim defining a plurality of purging outlets that are fluidly coupled with the purging inlet, each of the plurality of purging outlets being fluidly coupled with the first aperture;
• a pumping liner seated on the choke plate;
• and
• a faceplate seated on the pumping liner.

A substrate processing system, comprising:

• a chamber body defining a transfer region;
• a substrate support disposed within the transfer region, the substrate support comprising:
• a ground plate;
• a first isolator seated atop the ground plate;
• and
• a second isolator seated atop the first isolator.