Epitaxial growth apparatus and multi-layer gas supply module used therefor

A multi-layer gas supply module used for an epitaxial growth apparatus, in which the module supplies a gas input to a reaction chamber of the epitaxial growth apparatus, the module comprising:

• an injector including ports of a plurality of layers, each of which discharges a different gas for each layer, among the ports of the plurality of layers, the ports of each layer including a center port corresponding to a central region of the wafer, a pair of edge ports corresponding to both edge regions of the wafer, and a pair of middle ports respectively disposed between the center port and the pair of edge ports;
• a flow distribution unit configured to independently distribute the gas to the ports by including a single inflow line receiving the gas from a source module configured to provide the gas, a plurality of branch lines branched off from the single inflow line and directly connected to the respective ports, and a mass flow controller connected to each of the ports;
• and
• a baffle including through holes which are positioned in front of the injector, and through which the gas discharged from the ports passes, among the through holes, the through holes corresponding to the ports of at least one layer among the ports of the plurality of layers having shapes different from each other.

An epitaxial growth apparatus comprising:

• a reaction chamber;
• a susceptor positioned in the reaction chamber and configured to seat a wafer thereon;
• and
• a multi-layer gas supply module configured to supply a gas to the reaction chamber to form an epitaxial layer on the wafer,
• wherein the multi-layer gas supply module includes
• an injector including ports of a plurality of layers, each of which discharges a different gas for each layer, among the ports of the plurality of layers, the ports of each layer including a center port corresponding to a central region of the wafer, and a pair of edge ports corresponding to both edge regions of the wafer, and
• a flow distribution unit configured to distribute gas flows input to the center port and the edge port among the ports of each layer independently from each other.