Semiconductor processing apparatus and mixing inlet device

Semiconductor processing equipment, comprising:

• a process chamber;
• and
• a mixing inlet device arranged at a top of the process chamber of the semiconductor processing equipment and configured to input a process gas into the process chamber, including:
• a cover assembly, a bottom of the cover assembly covering the top of the process chamber, including:
• a mixing channel arranged in the cover assembly;
• and
• a mixing inlet block arranged at a center position at a top of the cover assembly and including:
• a plurality of inlet channels;
• and
• a first annular chamber, a top of the first annular chamber communicating with the plurality of inlet channels, a bottom of the first annular chamber communicating with the mixing channel of the cover assembly;
• and
• wherein:
• the mixing channel is configured to mix the process gas in the mixing inlet block again and input the process gas into the process chamber;
• the plurality of inlet channels extend along a tangential direction of the first annular chamber;
• and
• outlet holes of the plurality of inlet channels are distributed evenly along a circumferential direction of the first annular chamber.