Deposition apparatus and deposition method using the same
AssigneeSamsung Display Co., Ltd.
InventorsHYUNEOK SHIN, JOONYONG PARK
Life of this patent
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Abstract
A deposition apparatus includes a chamber in which an inner space is defined, a movement device which moves a substrate to which a deposition material is provided, and a deposition source which is accommodated in the inner space and provides the deposition material. The deposition source includes a first deposition source which performs a first deposition process while the substrate is moved in a first direction by the movement device and a second deposition source which performs a second deposition process on the substrate after the first deposition process.
Claims20
A deposition apparatus comprising:
- a chamber in which an inner space is defined;
- a movement device which moves a substrate to which a deposition material is provided;
- and
- a deposition source accommodated in the inner space, wherein the deposition source provides the deposition material,
- wherein the deposition source includes:
- a first deposition source which performs a first deposition process while the substrate is moved in a first direction by the movement device;
- and
- a second deposition source which performs a second deposition process on the substrate after the first deposition process.
A deposition method comprising:
- providing a deposition apparatus, wherein the deposition apparatus includes a chamber, a deposition source disposed in an inner space of the chamber and including a first deposition source and a second deposition source, a movement device which moves a substrate to which a deposition material is provided, and a substrate holder which fixes the substrate;
- loading the substrate into the inner space of the chamber through the movement device;
- performing a first deposition process using the first deposition source while the substrate moves in a first direction;
- fixing the substrate to the substrate holder disposed over the second deposition source;
- and
- performing a second deposition process using the second deposition source after the substrate is fixed to the substrate holder.
Dependencies are inferred from the claim text.