Micromechanical environmental barrier device
AssigneeInfineon Technologies AG
InventorsHutomo Suryo Wasisto, Fabian Streb, Sebastian Anzinger, Marc Füldner, Dominic Maier
Life of this patent
Estimating the term…
Loading patent…
AssigneeInfineon Technologies AG
InventorsHutomo Suryo Wasisto, Fabian Streb, Sebastian Anzinger, Marc Füldner, Dominic Maier
Estimating the term…
A method for manufacturing a micromechanical environmental barrier chip includes providing a substrate having a first surface and an opposite second surface, depositing a material layer having a different etch characteristic than the substrate onto the first surface, creating a microstructured micromechanical environmental barrier structure on top of the material layer by applying a microstructuring process, applying an anisotropic etching process comprising at least one etching step for anisotropically etching from the second surface towards the first surface to create at least a cavity underneath the micromechanical environmental barrier structure, the cavity extending between the second surface and the material layer, and removing the material layer underneath the micromechanical environmental barrier structure to expose the environmental barrier structure.
A method for manufacturing a micromechanical environmental barrier chip, the method comprising:
A micromechanical environmental barrier chip, comprising:
A micromechanical environmental barrier chip, comprising:
Dependencies are inferred from the claim text.