Processing apparatus and substrate transfer method
AssigneeTokyo Electron Limited
InventorsTadashi OBIKANE, Fumito KAGAMI, Kaori ARAI
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AssigneeTokyo Electron Limited
InventorsTadashi OBIKANE, Fumito KAGAMI, Kaori ARAI
Estimating the term…
A processing apparatus according to an aspect of the present disclosure includes a pick configured to hold and transfer a substrate, a first suction pad disposed at a position in the pick where the first suction pad comes into contact with a concavely curved substrate, a second suction pad disposed at a position in the pick where the second suction pad comes into contact with a convexly curved substrate, a pressure sensor configured to detect a pressure in a first suction path connected to the first suction pad and a pressure in a second suction path connected to the second suction pad, and a controller configured to control suction operations by the first suction pad and the second suction pad based on a detection value of the pressure sensor.
A processing apparatus comprising:
A method of transferring a substrate by a pick provided with a first suction pad disposed at a position where the first suction pad comes into contact with a concavely curved substrate and a second suction pad disposed at a position where the second suction pad comes into contact with a convexly curved substrate, comprising:
Dependencies are inferred from the claim text.