Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a load port for storing a substrate;
• a load lock module configured to substitute an atmosphere of the substrate;
• an atmosphere transfer robot (ATR) configured to transfer the substrate between the load port and the load lock module;
• a plurality of process chambers for processing the substrate;
• a plurality of transfer robots configured to transfer the substrate to any one of the plurality of process chambers;
• and
• a share module arranged adjacent to a transfer chamber in which the plurality of transfer robots are disposed,
• wherein the load lock module is arranged between the ATR and the transfer robots and substitutes the atmosphere of the substrate with a normal pressure atmosphere or a vacuum atmosphere,
• the plurality of transfer robots include an upper transfer robot and a lower transfer robot which is arranged under the upper transfer robot in a vertical direction, and
• the plurality of transfer robots transfer the substrate in a vacuum state.

A substrate processing method comprising:

• providing a substrate to a cassette;
• transferring the substrate from the cassette to a load lock module and substituting a normal pressure atmosphere of the substrate with a vacuum atmosphere;
• transferring the substrate to a process chamber and performing a semiconductor process;
• transferring the substrate to the load lock module after the semiconductor process and substituting the vacuum atmosphere of the substrate with the normal pressure atmosphere;
• and
• taking the substrate out to the cassette.