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US 2024/0177976 A1Published application
Liner structure and substrate processing apparatus including the same
AssigneeSemes Co., Ltd.
InventorsHyoungkyu SON, Juyong JANG
Life of this patent
Estimating the term…
Abstract
Provided is a liner structure including a liner body, a heating coil arranged in the liner body and configured to heat the liner body, and a magnetic coil arranged below the heating coil in the liner body and configured to generate a magnetic field.
Claims20
A liner structure comprising:
- a liner body;
- a heating coil arranged in the liner body and configured to heat the liner body;
- and
- a magnetic coil arranged below the heating coil in the liner body and configured to generate a magnetic field.
1 more element
A substrate processing apparatus comprising:
- a chamber comprising an upper chamber and a lower chamber and configured to provide a processing space in which plasma processing is performed;
- a liner structure arranged on the lower chamber and configured to protect an inner wall of the lower chamber;
- and
- a substrate support arranged in the processing space and comprising a support chuck and a support rod, the support chuck being configured to support a substrate on which the plasma processing is performed, and the support rod being connected to the support chuck,
- wherein the liner structure comprises:
- a liner body comprising a horizontal portion and a vertical portion, the horizontal portion being arranged on an upper surface of the lower chamber, and the vertical portion protruding from the horizontal portion toward the inner wall of the lower chamber and extending in a vertical direction perpendicular to the upper surface of the lower chamber;
- a heating coil arranged in the horizontal portion and configured to heat the liner body;
- and
- a magnetic coil arranged in the vertical portion and configured to generate a magnetic field.
6 more elements
A substrate processing apparatus comprising:
- a chamber comprising an upper chamber and a lower chamber and configured to provide a processing space in which plasma processing is performed;
- a liner structure arranged on the lower chamber and configured to protect an inner wall of the lower chamber;
- a substrate support arranged in the processing space and comprising a support chuck and a support rod, the support chuck being configured to support a substrate on which the plasma processing is performed, and the support rod being connected to the support chuck;
- an upper electrode arranged on the substrate support to face the support chuck;
- a first power device configured to supply power to a magnetic coil of the liner structure;
- a second power device configured to supply power to a heating coil of the liner structure;
- a shielding structure covering an outer wall of the lower chamber;
- and
- an insulating structure arranged on an outer wall of the liner structure,
- wherein the liner structure comprises:
- a liner body comprising a horizontal portion and a vertical portion, the horizontal portion being arranged on an upper surface of the lower chamber, and the vertical portion protruding from the horizontal portion toward the inner wall of the lower chamber, extending in a vertical direction perpendicular to the upper surface of the lower chamber, and spaced apart from the inner wall of the lower chamber;
- the heating coil wound one time in the horizontal portion and configured to heat the liner body;
- and
- the magnetic coil wound multiple times in the vertical direction in the vertical portion and configured to generate a magnetic field.
11 more elements
Dependencies are inferred from the claim text.