Matching network module and substrate processing apparatus including the same

A substrate processing apparatus comprising:

• a plurality of radio frequency (RF) generators;
• a matching network module connected to the plurality of RF generators;
• and
• a plasma chamber connected to the matching network module and having a reaction space,
• wherein the matching network module comprises:
• a plurality of housings individualized to reduce cross RF interference;
• a plurality of matching networks respectively mounted in the plurality of housings to separately perform impedance matching between the plurality of RF generators and the plasma chamber;
• and
• a common output rod connecting output terminals of the plurality of matching networks to each other.

A matching network module comprising:

• a plurality of housings individualized to reduce cross radio frequency (RF) interference;
• a plurality of matching networks respectively mounted in the plurality of housings to separately perform impedance matching between a plurality of RF generators and a plasma chamber;
• and
• a common output rod connecting output terminals of the plurality of matching networks to each other,
• wherein the common output rod comprises:
• a plurality of fixing rods separately mounted on the plurality of housings so as to be separately connected to the output terminals of the plurality of matching networks;
• and
• at least one connecting rod connected to at least some of the fixing rods,
• wherein at least two adjacent ones of the plurality of housings are couplable to or decouplable from each other,
• wherein coupling grooves are formed at coupling positions of the at least two adjacent housings to be coupled to each other, and
• wherein alignment plates are fitted into the coupling grooves to couple the at least two adjacent housings to each other.