Substrate processing apparatus

A substrate processing apparatus, comprising:

• a substrate cleaning apparatus, comprising a first frame, a first frame placement area, a substrate cleaning and drying area, a first frame clamping area and a first frame return area, the substrate cleaning and drying area is communicated to one side of the first frame placement area, the first frame clamping area is communicated to one side of the substrate cleaning and drying area, the first frame return area is communicated to the first frame clamping area and located at one side of the first frame placement area, the substrate cleaning and drying area and the first frame clamping area, the first frame makes a movement in the first frame placement area, the substrate cleaning and drying area, the first frame clamping area and the first frame return area, the first frame is provided with two fixtures, four power mechanisms and two first linkages, the fixtures are arranged in an opposite direction, two ends of each the fixture are respectively provided with the power mechanism, the power mechanisms respectively comprises a housing, a rack, a gear, an elastic element and a drive element, the rack is mutually meshed with the gear to be disposed in the housing, one side of the gear is connected to one end of the fixture, the elastic element abuts between the rack and the housing, the drive element is disposed on another side of the gear or the rack, and the drive element is exposed outside the housing, the first linkages are arranged in an opposite direction, two ends of each the first linkage are provided with the power mechanism, the first linkages are located between the fixtures.