Resist underlayer film-forming composition

A resist underlayer film-forming composition comprising a solvent and a polymer,

• wherein the polymer has at a terminal thereof a structure represented by the following Formula (103):
• (in Formula (103), Ar represents an optionally substituted aromatic ring having 6 to 40 carbon atoms;
• L represents a single bond, an ester bond, an ether bond, an alkylene group having 1 to 10 carbon atoms, or an alkenylene group having 2 to 10 carbon atoms;
• and n represents an integer of 1 to 3).

A resist underlayer film-forming composition comprising a solvent and a polymer represented by the following Formula (P1):

• (in Formula (P1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, a methyl group, or an ethyl group;
• Q1 represents a divalent organic group;
• T2 and T3 each independently represent a single bond, an ester bond, or an ether bond;
• L2 and L3 each independently represent a single bond, an optionally substituted alkylene group having 1 to 10 carbon atoms, or an optionally substituted alkenylene group having 2 to 10 carbon atoms;
• U represents a nitro group;
• D represents an aromatic ring having 6 to 40 carbon atoms or a heterocyclic ring;
• and n represents an integer of 0 to 3).

A resist underlayer film-forming composition comprising a solvent and a polymer or compound having at a terminal thereof a structure represented by the following Formula (200):

• (in Formula (200), Ar represents an optionally substituted aromatic ring having 6 to 40 carbon atoms;
• L2 represents an optionally substituted alkenylene group having 2 to 10 carbon atoms;
• n quantity of R2 each independently represent a group selected from the group consisting of a hydroxy group, a halogen atom, a carboxy group, a nitro group, a cyano group, a methylenedioxy group, an acetoxy group, a methylthio group, an amino group, an optionally substituted alkyl group having 1 to 10 carbon atoms, and an optionally substituted alkoxy group having 1 to 10 carbon atoms;
• n represents an integer of 0 to 5;
• and * represents a binding site to a residue of the polymer or compound).

A resist underlayer film-forming composition comprising a solvent and a polymer having at a terminal thereof a structure represented by the following Formula (300):

• (in Formula (300), Ar represents an optionally substituted aryl group having 6 to 40 carbon atoms;
• L3 represents a single bond, an ester bond, or an ether bond;
• T3 represents a single bond, an optionally substituted alkylene group having 1 to 10 carbon atoms, or an optionally substituted alkenylene group having 2 to 10 carbon atoms;
• n quantity of R3 each independently represent a monovalent organic group;
• n represents an integer of 0 to 5;
• and * represents a binding site to a residue of the polymer;
• and at least one cyano group is present in Formula (300)).