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US 2024/0176236 A1Published application
Onium salt, chemically amplified resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorMasahiro Fukushima
Life of this patent
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Abstract
An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has advantages including high solvent solubility, high sensitivity, a high contrast, and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation.
Claims17
An onium salt having the formula (1):
- wherein n1 is 0 or 1, n2 is an integer of 1 to 3, n3 is an integer of 1 to 4, n4 is an integer of 0 to 4, meeting n2+n3+n4≤5 in case of n1=0 and n2+n3+n4≤7 in case of n1=1, n5 is an integer of 0 to 4,
- RAL forms an acid labile group with the adjoining oxygen atom,
- I and —O—RAL are attached to adjoining carbon atoms,
- R1 is a C1-C20 hydrocarbyl group which may contain a heteroatom,
- LA and LB are each independently a single bond, ether bond, ester bond, sulfonic ester bond, carbonate bond or carbamate bond,
- XL is a single bond or a C1-C40 hydrocarbylene group which may contain a heteroatom,
- Q1 and Q2 are each independently hydrogen, fluorine or a C1-C6 fluorinated saturated hydrocarbyl group,
- Q3 and Q4 are each independently fluorine or a C1-C6 fluorinated saturated hydrocarbyl group, and
- Z+ is an onium cation.
6 more elements
Dependencies are inferred from the claim text.