Reflector plate for substrate processing
AssigneeApplied Materials, Inc.
InventorWolfgang R. ADERHOLD
Life of this patent
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Abstract
Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A pyrometer of the plurality of pyrometers is coupled to an opening formed in a sub-reflector plate. Chambers including a reflector plate assembly are also described herein.
Claims4
A reflector plate assembly for processing a substrate, comprising:
- a base reflector plate having a plurality of sub-reflector plates embedded therein;
- and
- a sectioned cover comprising a plurality of raised sections covering the plurality of sub-reflector plates.
Dependencies are inferred from the claim text.