Vapor phase precursor delivery system
AssigneeASM IP Holding B.V.
InventorsDieter Pierreux, Jan Deckers, Theodorus G.M. Oosterlaken
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Abstract
A vapor phase precursor delivery system for delivering a vapor phase precursor for depositing a layer in a vapor phase deposition apparatus is disclosed. The vapor phase precursor delivery system having: a plurality of vessels constructed and arranged to store and vaporize the same precursor; and a gas inlet and a gas outlet operably connected with one or more of the plurality of vessels. A vapor phase deposition apparatus, such as for example a vertical furnace may have such a vapor phase precursor delivery system for depositing a layer on a substrate.
Claims22
A vapor phase precursor delivery system comprising:
- a plurality of vessels constructed and arranged to store and vaporize a precursor;
- and
- a gas inlet and a gas outlet operably connected with the plurality of vessels, wherein the plurality of vessels are constructed and arranged to store and vaporize the same precursor and the system further comprises a plurality of outlet valves to control a gas flow comprising the same precursor out of one or more vessels of the plurality of vessels to the gas outlet.
Dependencies are inferred from the claim text.