Mist cvd film formation device and film formation method
AssigneeMurata Manufacturing Co., Ltd.
InventorsHiroshi SHIRAKI, Daisuke KAN, Yuichi SHIMAKAWA
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Abstract
A mist CVD film formation device that includes: a film forming chamber including: a mist inflow port through which a film forming mist containing a mist of a film forming raw material and a carrier gas flows into the film forming chamber, a stage that supports a film forming target, and a mist outflow port through which the film forming mist flows out of the film forming chamber, wherein an outflow port sectional area is smaller than a film forming chamber interior sectional area; and a heater that heats the stage.
Claims20
A mist CVD film formation device comprising:
- a film forming chamber including:
- a mist inflow port through which a film forming mist containing a mist of a film forming raw material and a carrier gas flows into the film forming chamber,
- a stage that supports a film forming target, and
- a mist outflow port through which the film forming mist flows out of the film forming chamber,
- wherein an outflow port sectional area is smaller than a film forming chamber interior sectional area, the film forming chamber interior sectional area is a sectional area of a space in the film forming chamber in a cut surface obtained by cutting in a section orthogonal to a flowing direction of the film forming mist on the stage, and the outflow port sectional area is a sectional area of a space of the mist outflow port in a cut surface obtained by cutting the mist outflow port in the section orthogonal to the flowing direction of the film forming mist;
- and
- a heater that heats the stage.
A mist CVD film formation device comprising:
- a film forming chamber including:
- a mist inflow port through which a film forming mist containing a mist of a film forming raw material and a carrier gas flows into the film forming chamber,
- a stage that supports a film forming target, and
- a mist outflow port through which the film forming mist flows out of the film forming chamber,
- wherein a thermal conductivity of a first member located close to the mist inflow port relative to the stage in the film forming chamber is lower than a thermal conductivity of a material of the stage;
- and
- a heater that heats the stage.
A mist CVD film formation device comprising:
- a film forming chamber including:
- a mist inflow port which is an opening through which a film forming mist containing a mist of a film forming raw material and a carrier gas flows in,
- a stage on which a film forming target is placed, and
- a mist outflow port which is an opening through which the film forming mist flows out,
- wherein a thermal conductivity of a member located on a top surface of the film forming chamber is lower than a thermal conductivity of a material of the stage;
- and
- a heater that heats the stage.
Dependencies are inferred from the claim text.