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US 2024/0174699 A1Published application
Functionalized organotin precursors and related methods
AssigneeEntegris, Inc.
InventorsDavid M. Ermert, Thomas M. Cameron, Claudia Fafard
Life of this patent
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Abstract
Precursors useful in the formation of tin-containing films are provided. The precursors comprise a functionalized tin compound in which one or more ligands are coordinated to Sn, and the Sn is functionalized with at least one functional group. Methods for forming the precursors and methods for forming tin-containing films using the precursors are further provided.
Claims20
A composition comprising:
- a precursor of the formula:
- where:
- R is an alkyl, an alkenyl, an alkynyl, a cycloalkyl, an aryl, a silyl, a silylalkyl, an aminoalkyl, an alkoxyalkyl, or an aralkyl;
- L1, L2, and L3 are each independently an amide, an alkoxide, an acetylide, a carbamate, or a carboxylate.
1 more element
A method comprising:
- obtaining a tin compound,
- obtaining a halide compound,
- contacting the tin compound and the halide compound so as to form a precursor of the formula:
- where:
- R is an alkyl, an alkenyl, an alkynyl, a cycloalkyl, an aryl, a silyl, a silylalkyl, an aminoalkyl, an alkoxyalkyl, or an aralkyl;
- L1, L2, and L3 are each independently an amide, an alkoxide, an acetylide, a carbamate, or a carboxylate.
3 more elements
A method comprising:
- obtaining a precursor;
- wherein the precursor has the formula:
- where:
- R is an alkyl, an alkenyl, an alkynyl, a cycloalkyl, an aryl, a silyl, a silylalkyl, an aminoalkyl, an alkoxyalkyl, or an aralkyl;
- L1, L2, and L3 are each independently an amide, an alkoxide, an acetylide, a carbamate, or a carboxylate;
- obtaining at least one co-reactant precursor;
- vaporizing the precursor to obtain a vaporized precursor;
- vaporizing the at least one co-reactant precursor to obtain at least one vaporized co-reactant precursor;
- contacting at least one of the vaporized precursor, the at least one vaporized co-reactant precursor, or any combination thereof, with a substrate, under vapor deposition conditions, to form a tin-containing film on the substrate.
6 more elements
Dependencies are inferred from the claim text.