Fused ring aromatic hydrocarbon derivative, preparation method therefor, and use thereof in lithography
AssigneeInstitute of Chemistry, Chinese Academy of Sciences
InventorsGuoqiang YANG, Xue CONG, Xudong GUO, Rui HU, Shuangqing WANG
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Abstract
A negative chemically amplified photoresist of a fused ring aromatic hydrocarbon derivative, a preparation method therefor, and use thereof are provided. A matrix component in the photoresist is a fused ring aromatic hydrocarbon derivative represented by general formula (I) that can be dissolved in organic solvents commonly used in photoresists. The photoresist composition of the present disclosure can be prepared to give a uniform film, and a molecular glass serving as the matrix component is not precipitated in the film preparation process.
Claims11
A compound represented by formula (I):
- wherein A is selected from a fused ring aromatic hydrocarbon;
- Ra, Rb, Rc, and Rd are the same or different and are each independently selected from H or
- provided that at least one of Ra, Rb, Rc, and Rd is
- each R is the same or different and is independently selected from H, —OC1-20 alkyl, or OR1, provided that at least one R is OR1 or H;
- R1 is selected from the following groups that are unsubstituted or optionally substituted with one, two, or more R11:
- C2-20 alkenyl and 3- to 20-membered epoxy;
- each R11 is the same or different and is independently selected from oxo(═O) and the following groups that are unsubstituted or optionally substituted with one, two, or more R12:
- C1-20 alkyl, C1-20 alkoxy, C2-20 alkenyl, 3- to 20-membered heterocyclyl, and C6-20 aryl;
- each R12 is the same or different and is independently selected from C1-20 alkyl, C2-20 alkenyl, C1-20 alkoxy, and C6-20 aryl.
A negative photoresist composition, comprising a matrix, wherein the matrix is selected from at least one of compounds represented by formula (I);
- preferably, the composition further comprises a photoacid generator, wherein the photoacid generator is, for example, selected from ionic or non-ionic acid generators, such as at least one of triphenyl sulfonium triflate, triphenylsulfonium nonaflate, bis(4-tert-butylphenyl)iodonium p-toluenesulfonate, N-hydroxynaphthalimide triflate, and benzyl(4-hydroxyphenyl)methylsulfonium hexafluoroantimonate;
- preferably, the composition further comprises an organic solvent, wherein the organic solvent is, for example, selected from alkane, ester, ether, and haloalkane compounds;
- the preferred organic solvent is at least one of 1,2,3-trichloropropane, anisole, propylene glycol methyl ether acetate, propylene glycol monoacetate, propylene glycol diacetate, ethyl lactate, propylene glycol monomethyl ether, methyl ethyl ketone, methyl isobutyl ketone, neopentyl acetate, butyl acetate, diethylene glycol ethyl ether, dichloromethane, and tetrahydrofuran.
Dependencies are inferred from the claim text.