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US 2024/0174559 A1Published application
Processing apparatus and processing method
AssigneeSamsung Display Co., Ltd.
InventorsJEONGJIN PARK, YONG-HOON KWON, BYUNGHOON KIM, TAEOH KIM
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Abstract
A processing apparatus includes a first processing unit to spray a mixture into a first region of a processing target, and a second processing unit to irradiate a beam into the first region of the processing target, and maintain a temperature of the first region to a predetermined temperature or more, in which the predetermined temperature is for ion-exchange between the processing target and some materials of the mixture.
Claims20
A processing apparatus comprising:
- a first processing unit which sprays a mixture into a first region of a processing target, and
- a second processing unit which irradiates a beam into the first region of the processing target, and maintains a temperature of the first region to a predetermined temperature or more,
- wherein the predetermined temperature is for ion-exchange between the processing target and a partial material of the mixture.
A processing method comprising:
- preparing for a processing target and a processing apparatus;
- pre-processing the processing target;
- and
- cutting and post-processing the processing target,
- wherein the cutting and the post-processing of the processing target includes:
- irradiating a beam into a first region of the processing target;
- providing a first material to the first region and forming a predetermined cut surface in the first region;
- and
- providing a second material different from the first material to the first region and healing and tempering the predetermined cut surface, and
- wherein the first material and the second material are simultaneously provided.
7 more elements
Dependencies are inferred from the claim text.