Gas Separation Membranes
OwnerShigehide Itoh, Petrus Van Kesselinventors
Life of this patent
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Abstract
A gas separation membrane comprising the following layers: (i) a porous support layer; and (ii) a discriminating layer comprising groups of the Formula (1): M—(O—)x, wherein: M is a metal or metalloid atom; O is an oxygen atom; and x has a value of at least 4; optionally (iii) a layer which comprises a fluorinated polymer; and optionally (iv) optionally a protective layer; wherein: (a) the porous support layer (i) comprises less than 10 mg/m2 of monovalent metal ions; (b) the discriminating layer (ii) comprises a surface comprising at least 10 atomic % of M of Formula (1) groups, wherein M is as hereinbefore defined; and (c) when layer (iii) is present, layer (ii) is located between layers (i) and (iii).
Claims15
1-23. (canceled)
A gas separation membrane
- comprising the following layers:
- (i) a porous support layer comprising a porous support material and a polysiloxane gutter layer (GL) and/or a precursor layer comprising a crosslinkable polysiloxane polymer;
- (ii) a discriminating layer formed by plasma treatment of the surface of said polysiloxane gutter layer (GL) and/or precursor layer comprising groups of the Formula (1):
- M—(O—)x Formula (1)
- wherein:
- M is a metal or metalloid atom;
- O is an oxygen atom;
- and
- x has a value of at least 4;
- optionally (iii) a layer which comprises a fluorinated polymer;
- and
- optionally (iv) optionally a protective layer;
- wherein:
- (a) the porous support layer (i) comprises at least 0.1 mg/m2 and less than 10 mg/m2 of monovalent metal ions;
- (b) the discriminating layer (ii) comprises a surface comprising at least 10 atomic % of M of Formula (1) groups, wherein M is as hereinbefore defined;
- and
- (c) when layer (iii) is present, layer (ii) is located between layers (i) and (iii).
Dependencies are inferred from the claim text.