Substrate processing apparatus
AssigneeJusung Engineering Co., Ltd.
InventorsIn Woo BACK, Jong Chul KIM, Yeong Seop BYEON, In Cheol YEO
Life of this patent
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Abstract
The present inventive concept relates to a substrate processing apparatus comprising: a chamber providing a processing space; a lid for covering the top of the chamber; a substrate support part supporting at least one substrate and rotating about a rotation axis such that the substrate passes through an imaging area; a gas injection part for injecting a process gas toward the substrate support part; an area image capturing part for capturing an image of the imaging area to obtain a thermal image of the imaging area; and a calculation part for calculating the temperature data of the substrate from the thermal image.
Claims20
An apparatus for processing substrate, the apparatus comprising:
- a chamber providing a processing space;
- a lid covering an upper portion of the chamber;
- a substrate supporting unit supporting at least one substrate and rotating about a rotational shaft so that a substrate passes through a photographing region;
- a gas injection unit injecting a processing gas toward the substrate supporting unit;
- a region photographing unit photographing the photographing region to obtain a thermal image of the photographing region;
- and
- a calculation unit calculating temperature data of a substrate from the thermal image.
Dependencies are inferred from the claim text.