Method and device for producing an mfc film

A method of casting an MFC film on a substrate, comprising:

• providing an MFC dispersion having a solids content of about 2.5-25% by weight and a viscosity which is above about 4 Pas at a shear rate of 20 s−1;
• exposing the MFC dispersion to a first shearing step, which provides a shear rate of above 10 s−1;
• introducing the MFC dispersion into a film forming device;
• in the film forming device, laterally distributing the MFC dispersion;
• in the film forming device, subsequent to the laterally distributing, exposing the distributed MFC dispersion to a second shearing step, providing a shear rate of above 100 s−1;
• in the film forming device, subsequent to the second shearing step, decelerating the distributed MFC dispersion, such that the shear rate is reduced;
• in the film forming device, subsequent to the decelerating step, exposing the MFC dispersion to a third shearing step, providing a shear rate of above 100 s−1;
• and
• simultaneously with, or subsequent to, the third shearing step, depositing the MFC dispersion on the substrate, while moving the substrate relative to the film forming device, such that a wet MFC film is formed on the substrate.