Hydrogen fluoride gas removal device and method for removing hydrogen fluoride gas
AssigneeResonac Corporation
InventorsRiku KANAUCHI, Yohsuke FUKUCHI, Hiroshi KOBAYASHI
Life of this patent
Estimating the term…
Loading patent…
AssigneeResonac Corporation
InventorsRiku KANAUCHI, Yohsuke FUKUCHI, Hiroshi KOBAYASHI
Estimating the term…
A hydrogen fluoride gas removal device includes: a hydrogen fluoride gas removal treatment machine that is configured to perform a treatment of removing the hydrogen fluoride gas from the mixed gas by bringing the mixed gas into contact with a removal agent for removing the hydrogen fluoride gas from the mixed gas; a removal agent supply machine that is configured to supply the removal agent to the hydrogen fluoride gas removal treatment machine; a removal agent moving machine that is configured to move the removal agent, which is accommodated in the hydrogen fluoride gas removal treatment machine, within the hydrogen fluoride gas removal treatment machine; and a removal agent discharge machine that is configured to discharge the used removal agent from the hydrogen fluoride gas removal treatment machine.
A hydrogen fluoride gas removal device which removes hydrogen fluoride gas from a mixed gas containing the hydrogen fluoride gas and another type of gas, the hydrogen fluoride gas removal device comprising:
A method for removing hydrogen fluoride gas, in which hydrogen fluoride gas is removed from a mixed gas containing the hydrogen fluoride gas and another type of gas, the method comprising:
Dependencies are inferred from the claim text.