Process for producing at least one filament, vapour-depositing apparatus for carrying out such a process and filament-production installation with such a vapour-depositing apparatus

A method for producing at least one filament, in particular an artificial-lawn filament, a packaging tape or a monofilament, preferentially a cohort of filaments, with at least one stretching step in which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is stretched, wherein the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is in a vapor-depositing region flown around by water vapor before and/or during a stretching, wherein at least one vapor parameter of the water vapor located in the vapor-depositing region, in particular in the form of dry vapor, is controlled so as to counteract a formation of droplets on the at least one filament, wherein the vapor parameter is monitored by at least one sensor element of a vapor-depositing apparatus, wherein a control or regulation unit of the vapor-depositing apparatus or of a filament-production installation comprising the vapor-depositing apparatus adjusts the vapor parameter such that a condensation of the water vapor, in particular the dry vapor, on the filament is counteracted

The method according to claim 1, wherein for an adjustment of the vapor parameter, the water vapor, in particular the dry vapor, is heated to a temperature of more than 125° C. before entry into the vapor-depositing region.

The method according to claim 1, wherein in at least one method step, a temperature which the water vapor, in particular the dry vapor, is brought to before entry into the vapor-depositing region is adjusted depending on the vapor parameter of the vapor-depositing region.

The method according to claim 1, wherein the water vapor, in particular the dry vapor, is expanded upon entry into the vapor-depositing region.

The method according to claim 1, wherein an inlet valve for letting the water vapor, in particular the dry vapor, into the vapor-depositing region is regulated depending on the vapor parameter.

The method according to claim 1, wherein a temperature of the water vapor, in particular the dry vapor, in the vapor-depositing region is maintained above a condensation temperature of the water vapor, in particular the dry vapor.

The method according to claim 1, wherein the water vapor, in particular the dry vapor, is actively removed, in particular suctioned, out of the vapor-depositing region.

The method according to claim 1, wherein in order to achieve a homogeneous distribution of the water vapor, in particular the dry vapor, the water vapor, in particular the dry vapor, is let into the vapor-depositing region in distributed fashion via several vapor inlets.

The method according to claim 1, comprising a further stretching step, before and/or during which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is flown around by hot air.

The method according to claim 1, comprising at least one fixing step, during which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is flown around by hot air or water vapor, in particular dry vapor.

A vapor-depositing apparatus for a filament-production installation, in particular an extrusion spinning installation, for the production of at least one filament, in particular an artificial-lawn filament, a packaging tape or a monofilament, following a method according to claim 1, with at least one control or regulation unit, which is configured to adjust the vapor parameter such that a condensation of the water vapor, in particular the dry vapor, on the filament can be counteracted, and with at least one vapor generator or at least one heating and/or cooling aggregate, the vapor generator being configured to vaporize water for a production of the water vapor, in particular the dry vapor, the heating and/or cooling aggregate being configured to adapt, before entry into the vapor-depositing region, the temperature of the water vapor, in particular the dry vapor, in particular the temperature of the water vapor, in particular the dry vapor, obtained from an external vapor source.