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US 2024/0120436 A1Published application
Laser diodes, leds, and silicon integrated sensors on patterned substrates
OwnerJie Piaoinventor
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Abstract
The present disclosure falls into the field of optoelectronics, particularly, includes the design, epitaxial growth, fabrication, and characterization of Laser Diodes (LDs) operating in the ultraviolet (UV) to infrared (IR) spectral regime on patterned substrates (PSs) made with (formed on) low cost, large size Si, or GaN on sapphire, GaN, and other wafers. We disclose three types of PSs, which can be universal substrates, allowing any materials (III-Vs, II-VIs, etc.) grown on top of it with low defect and/or dislocation density.
Claims9
A method comprising:
- Method of fabricating LD;
- Method of reducing dislocation and enhancing crystalline quality of epitaxial growth of semiconductor;
- Method of fabrication.
A method of epitaxial growth LD structures on PSs for reduced dislocation densities.
Dependencies are inferred from the claim text.