Exhaust system and exhaust method using buffer

An exhaust system comprising:

• a process chamber in which a semiconductor processing is performed;
• a buffer connected to the process chamber and configured to receive waster gas generated during the semiconductor processing, the buffer including a lower internal space and an upper internal space;
• a first reactor configured to heat-treat and burn the waste gas;
• a plurality of valves between the buffer and the first reactor;
• a wet tank connected to the first reactor, arranged below the first reactor, and configured to store cleaning water;
• a wet tower configured to perform cleaning treatment on the waste gas by using the cleaning water;
• and
• a controller configured to control opening and closing of the plurality of valves, the plurality of valves including a first valve and a second valve,
• wherein the buffer comprises a first outlet in communication with the upper internal space and a second outlet in communication with the lower internal space, and is further configured to dualize and disperse powder generated from the waste gas, and
• the plurality of valves comprise the first valve configured to adjust fluid flow between the first outlet and the first reactor and the second valve configured to adjust fluid flow between the second outlet and the first reactor.

An exhaust method comprising:

• performing a semiconductor processing;
• supplying waste gas generated during the semiconductor processing to a buffer;
• dualizing and dispersing the supplied waste gas by using the buffer;
• supplying the dispersed waste gas to at least one reactor;
• performing heat treatment on the supplied waste gas;
• and
• cleaning the heat-treated waste gas by using a cleaning water.