Temperature control method
AssigneeTokyo Electron Limited
InventorsTakari Yamamoto, Noriiki Masuda, Kenichiro Nakamura, Hiroshi Koizumi
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AssigneeTokyo Electron Limited
InventorsTakari Yamamoto, Noriiki Masuda, Kenichiro Nakamura, Hiroshi Koizumi
Estimating the term…
A temperature control method of controlling a temperature of a semiconductor wafer mounted on a mounting table includes a supply process of supplying, in a state that a supply of a power to a heater configured to heat the mounting table is stopped or the power is maintained to be constant, a heat transfer gas into a gap between the semiconductor wafer and the mounting table; a measurement process of measuring a temperature variation of the mounting table due to heat exchange between the semiconductor wafer and the mounting table through the heat transfer gas; a calculation process of calculating a correction value based on the temperature variation of the mounting table; and a control process of starting the supply of the power and controlling the power such that the temperature of the mounting table reaches a target temperature corrected with the correction value.
A temperature control method comprising:
A temperature control method comprising:
A plasma processing method comprising:
Dependencies are inferred from the claim text.