Support member for supporting a wafer during a heat treatment
AssigneePatek Philippe SA Geneve
InventorSylvain JEANNERET
Life of this patent
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Abstract
Disclosed is a support member for supporting a wafer during a heat treatment of the wafer. The support member includes a support plate and spacers and retaining elements carried by the support plate. The spacers serve to maintain a gap between the support plate and the wafer. The retaining elements serve to prevent the wafer from moving horizontally. The support plate may be made of silicon, quartz or silicon carbide. The spacers and the retaining elements may be fixed to the support plate by bayonet-type connections.
Claims7
A support member for supporting a wafer during a heat treatment of the wafer, the support member comprising a support plate and spacers and retaining elements carried by the support plate, the spacers serving to maintain a gap between the support plate and the wafer, the retaining elements serving to prevent the wafer from moving horizontally.
Dependencies are inferred from the claim text.