Optical device, method for adjusting a setpoint deformation and lithography system
OwnerMarkus Raab, Stefan Troeger +6inventors
InventorsMarkus Raab, Stefan Troeger, Sascha Bleidistel, Thilo Pollak, Alexander Vogler, Klaus Gwosch, Andreas Koeniger, Matthias Manger
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Abstract
An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.
Claims27
An optical apparatus, comprising:
- an optical element comprising an optical surface;
- an actuator configured to deform the optical surface;
- and
- a strain gauge device configured to determine a deformation of the optical surface,
- wherein the strain gauge device comprises an optical fiber configured to maintain polarization.
A method of using an actuator to set a target deformation of an optical surface of an optical element of a lithography system, the method comprising:
- determining an actual deformation of the optical surface by virtue of an actual strain of a measurement region,
- wherein a strain gauge device is provided for determining the deformation of the optical surface, and the strain gauge device comprising an optical fiber configured to maintaining polarization.
Dependencies are inferred from the claim text.